Viewing a response to: @taskmaster4450le/re-taskmaster4450le-34e6hnozb
TSMC plans to incorporate high-NA EUV scanners into its 1.4nm (A14) process, which is scheduled to enter mass production in 2027. However, these advanced lithography systems will not be immediately operational. Rigorous testing, fine-tuning, and process optimization will be required before they can be integrated into high-volume manufacturing.
| author | taskmaster4450le |
|---|---|
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